In the non-transmission area NTA, the first electrode PE1 may be disposed on the via insulating layer VIA. The first electrode PE1 may be electrically connected to the drain electrode DE. For example, the first electrode PE1 may electrically contact part of the drain electrode DE through a through hole penetrating the via insulating layer VIA. The first electrode PE1 may include a conductive material. For example, the first electrode PE1 may include at least one of ITO, IZO, IGO, AZO, and IGZO. As an example, the first electrode PE1 may include a same material or a similar material as the gate electrode GE.

In the non-transmission area NTA, the pixel defining layer PDL may be disposed on the via insulating layer VIA. The pixel defining layer PDL may cover or overlap at least a part of the first electrode PE1. The pixel defining layer PDL may define an opening exposing a part of the first electrode PE1.

In the non-transmission area NTA, the light emission layer EL may be disposed on the first electrode PE1. The light emission layer EL may further include at least one of a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer. The light emission layer EL may emit light.

In the non-transmission area NTA, the second electrode PE2 may be disposed on the pixel defining layer PDL. The second electrode PE2 may cover or overlap the light emission layer EL. The second electrode PE2 may include a metal having a relatively low work function. For example, the second electrode PE2 may include at least one of lithium, calcium, aluminum, silver, and magnesium.