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Method for manufacturing vapor chamber

專利號
US12213284B2
公開日期
2025-01-28
申請人
Jentech Precision Industrial Co., LTD.(TW Taoyuan)
發(fā)明人
Chun-Ta Yeh; Chin-Long Lin
IPC分類
H05K7/20; B21D53/02; B23P15/26
技術(shù)領(lǐng)域
frame,body,plate,bodies,infusion,pillars,main,vapor,first,sp1
地域: Taoyuan

摘要

A vapor chamber includes a main body. The main body includes a base plate and a top plate. The base plate includes a plate body, a peripheral frame and a plurality of supporting pillars. The plate body has a surface. The peripheral frame is disposed on the surface of the plate body. The surface and the peripheral frame together define a first space. The first space is configured to accommodate a working fluid. The supporting pillars are located in the first space and are distributed on the surface of the plate body. The supporting pillars, the plate body and the peripheral frame are of an integrally-formed structure. The top plate abuts against the peripheral frame and the supporting pillars to seal up the first space.

說明書

With regards to the vapor chamber 100 as mentioned above, the present disclosure provides a manufacturing method 500 of the vapor chamber 100. For example, reference is made to FIG. 7. FIG. 7 is a flow diagram of a manufacturing method 500 of a vapor chamber 100 according to an embodiment of the present disclosure. In this embodiment, as shown in FIG. 7, a manufacturing method 500 includes the following operations (it is appreciated that the sequence of the operations and the sub-operations as mentioned below, unless otherwise specified, can all be adjusted upon the actual needs, or even executed at the same time or partially at the same time):

    權(quán)利要求

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