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Dielectric barrier plasma generator and plasma discharge starting method for dielectric barrier plasma generator

專利號
US12219688B2
公開日期
2025-02-04
申請人
Ushio Denki Kabushiki Kaisha(JP Tokyo)
發(fā)明人
Takahiro Hiraoka; Kensuke Nakamura; Takanori Samejima
IPC分類
H05H1/00; H05H1/24
技術(shù)領(lǐng)域
blowout,plasma,dielectric,electrode,voltage,outlet,gas,generator,substrate,in
地域: Tokyo

摘要

A dielectric barrier plasma generator includes: a dielectric substrate, a high-voltage electrode provided on a first surface of the dielectric substrate, a low-voltage electrode provided to face a second surface of the dielectric substrate, a power introduction section provided at a first end of the high-voltage electrode, a gas channel formed from a first end to a second end thereof between the dielectric substrate and the low-voltage electrode to allow gas to flow from the first end of the gas channel to the second end thereof, and a blowout outlet formed at the second end of the gas channel to blow out the gas that has flown through the gas channel and plasma that has been generated in the gas channel. The dielectric substrate includes a portion having a thickness being thinner when being closer to the blowout outlet.

說明書

In the plasma generator 200, by applying a voltage between the electrodes 201 and 201 while introducing a gas for generating plasma G through the top opening, a number of streamer discharge S is generated in an opposing region 202. Here, the gas for generating plasma G is introduced from a gas introduction hole 223 through an orifice 225 of a jetting plate 224 into an opposing region 202, hence the gas for generating plasma G is accelerated by the orifice 225 to jet into the opposing region 202 at high speed. This jet causes turbulence in the gas for generating plasma G, which in turn causes the streamer discharge S to be diffused and dispersed in the opposing region 202. Then, the dispersed streamer discharge S generates plasma P substantially uniformly throughout the entire opposing region 202, and this plasma P is blown out from the bottom opening of the opposing region 202 into a processing space 205 as plasma jet, spraying onto an object to be treated H. Patent Document 1 discloses that adopting the above configuration makes it possible to generate uniform plasma. Meanwhile, an electrode layer is designed to be thick such that an electrode section holds a dielectric body to secure the overall strength. In such a case, the dielectric body is very susceptible to cracking due to a difference in linear expansion coefficient between dielectric material and metal constituting an electrode, which poses a problem from a viewpoint of a service life. Typically, the dielectric body is made of ceramic materials, and the electrode is made of metal. Using the dielectric body having a thin wall causes a mechanical strain to occur due to the difference in linear expansion between ceramics and metal. This mechanical strain results in damaging the thin ceramics. A method to address this drawback includes that the thickness of the ceramics increases to secure its strength. However, when the thickness of the dielectric body increases, the dielectric loss also increases, which poses a problem of sacrificing the efficiency of plasma generation.

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