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Dielectric barrier plasma generator and plasma discharge starting method for dielectric barrier plasma generator

專利號
US12219688B2
公開日期
2025-02-04
申請人
Ushio Denki Kabushiki Kaisha（JP Tokyo）
發(fā)明人
Takahiro Hiraoka; Kensuke Nakamura; Takanori Samejima
IPC分類
H05H1/00; H05H1/24
技術(shù)領(lǐng)域
blowout,plasma,dielectric,electrode,voltage,outlet,gas,generator,substrate,in
地域： Tokyo

摘要

A dielectric barrier plasma generator includes: a dielectric substrate, a high-voltage electrode provided on a first surface of the dielectric substrate, a low-voltage electrode provided to face a second surface of the dielectric substrate, a power introduction section provided at a first end of the high-voltage electrode, a gas channel formed from a first end to a second end thereof between the dielectric substrate and the low-voltage electrode to allow gas to flow from the first end of the gas channel to the second end thereof, and a blowout outlet formed at the second end of the gas channel to blow out the gas that has flown through the gas channel and plasma that has been generated in the gas channel. The dielectric substrate includes a portion having a thickness being thinner when being closer to the blowout outlet.

說明書

The low-voltage electrode 20 has a plate shape and is provided in the side facing the second surface 13b (the lower surface in FIG. 2) of the dielectric substrate 12. The low-voltage electrode 20 may be connected to the ground potential directly or through a resistor. It may also be connected to the low voltage output of the power supply unit 42.

As shown in FIG. 2, the low-voltage electrode 20 is formed with a groove 22 on its surface facing the dielectric substrate 12, the groove extending from the first end (left end in FIG. 2) in the length direction (left-right direction in FIG. 2) to the second end (right end in FIG. 2). Specifically, as shown in FIG. 4, the groove 22 is formed in areas other than the outer circumferences 23a at both sides of the low-voltage electrode 20 in the width direction and the outer circumference 23b at the first end.

The dielectric substrate 12 and the low-voltage electrode 20 are stacked such that they are in contact with each other at the outer circumferences 23a and 23b. A space is formed in the portion where the groove 22 is formed, in other words, the space enclosed by the groove 22 and the second surface 13b of the dielectric substrate 12. This space forms a gas channel 25 to allow gas to flow from the first end to the second end.

權(quán)利要求

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