Hereinafter, a plasma generator 50 according to the second embodiment is will be described. The plasma generator 50 according to the second embodiment differs from the plasma generator 10 in the shape of the dielectric substrate, high-voltage electrode and low-voltage electrode, and is common in other points. Accordingly, the different points will be mainly described, and the common points will be omitted or simplified in the following. In addition, the same symbol is assigned to the configuration common to the plasma generator 10 according to the first embodiment.

FIG. 12 is a cross-sectional view of a dielectric barrier plasma generator according to the second embodiment. As shown in FIG. 12, the plasma generator 50 includes a dielectric substrate 52, a high-voltage electrode 54, and a low-voltage electrode 56.

The dielectric substrate 52, similar to the dielectric substrate 12, includes a flat portion 52a having a constant thickness and an inclined portion 52b formed continuously from the flat portion 52a and having a thickness being thinner when being closer to the blowout outlet 30. However, the flat portion 52a of the dielectric substrate 52 has a shorter length than the flat portion 12a of the dielectric substrate 12, and the inclined portion 52b has a more gradual slope than the inclined portion 12b.