In the dielectric barrier plasma generator according to the present invention, since the dielectric substrate includes a portion having a thickness being thinner when being closer to the blowout outlet, the portion has a larger capacitance when being closer to the blowout outlet. Discharge occurs at a place where the voltage applied to gas exceeds its dielectric breakdown voltage. Hence, setting the slope of the thickness of the dielectric substrate in a manner in which the voltage applied to gas exceeds its dielectric breakdown voltage in the vicinity of the blowout outlet enables plasma to be generated in the vicinity of the blowout outlet. As a result, this configuration is capable of uniformly ejecting plasma from the entire region of the blowout outlet. In addition, generating plasma in the vicinity of the blowout outlet improves the plasma generation efficiency.