Optionally, the heating the pixel definition layer transitional pattern to melt a part of the pixel definition layer transitional pattern, in such a manner to remove the undercut and form the gentle slope includes:
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- heating the pixel definition layer transitional pattern to melt the portion of the pixel definition layer transitional pattern, in such a manner to enable lateral surfaces of the second dam member and the third dam member to be connected as the gentle slope.
Optionally, the heating the pixel definition layer transitional pattern includes:
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- heating the pixel definition layer transitional pattern at a temperature of 80° C. to 100° C. for 12 to 48 hours.
Optionally, the forming the common, that is broken at the undercut, on the base substrate includes:
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- forming the common layer on the base substrate, where the common layer includes a first common layer portion at a pixel region defined by the pixel definition layer transitional pattern and a second common layer portion at a top surface of the pixel definition layer transitional pattern, and the first common layer portion and the second common layer portion are unconnected to each other.
Optionally, the forming the common layer on the base substrate includes: