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Method for fabricating air bridge, air bridge structure, and superconducting quantum chip

專利號
US12225832B2
公開日期
2025-02-11
申請人
TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED; SUZHOU INSTITUTE OF NANO-TECH & NANO-BIONICS (SINANO), CHINESE ACADEMY OF SCIENCES(CN Shenzhen CN Suzhou)
發(fā)明人
Wenlong Zhang; Sainan Huai; Yarui Zheng; Jiagui Feng; Kanglin Xiong; Sunan Ding
IPC分類
H10N60/83; H10N60/01; H10N60/81; H10N60/82; H10N69/00
技術領域
bridge,brace,air,patterned,opening,pier,etching,material,in,baking
地域: Guangdong

摘要

This disclosure includes a method for fabricating an air bridge, an air bridge structure, and a superconducting quantum chip, and relates to the field of circuit structures. In some examples, a method for fabricating an air bridge includes forming an air bridge brace structure on a substrate, and forming, on the air bridge brace structure and the substrate, an air bridge material layer with one or more openings in the air bridge material layer that reveal the air bridge brace structure. The air bridge material layer with the one or more openings is formed based on a patterned photoresist layer with patterns corresponding to the one or more openings. The method further includes removing, based on the one or more openings in the air bridge material layer, the air bridge brace structure to obtain the air bridge having the one or more openings.

說明書

In the related art, the release accuracy of the bridge brace is increased by improving the etching process. In the improved etching process, the effect of releasing the bridge brace is improved using methods such as changing the composition of an etching gas, adjusting an etching time, and detecting the composition of an exhaust gas after etching. However, it is still difficult to effectively remove a bridge brace material deep in a bridge hole. In conclusion, disadvantages are as follows:

1. Generally, an additional gas path needs to be added to equipment to modify the composition of the etching gas, which involves the difficulty of equipment modification.

2. An additional detection device is required for detecting the composition of the exhaust gas, which increases costs.

3. The method of adjusting the etching time by detecting the composition of the exhaust gas may prolong the etching time, which has relatively large impact on the performance of the junction device on a superconducting chip.

4. The modification of the composition of the etching gas involves inflammable and explosive gases such as methanol, which poses hidden dangers to the safety of the production workshop or laboratory.

In addition, a fully-enclosed air bridge without an opening is likely to cause unevenness of the deck such as bumps, dents, undulations, and the approach bridge is also likely to break.

權利要求

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