That is, when the opening is located at the approach bridge portion, the patterned region includes a region corresponding to the pier portion and the bridge top portion; when the opening is located at the approach bridge portion and the pier portion, the patterned region includes a region corresponding to the bridge top portion; when the opening is located at the bridge top portion, the patterned region includes a region corresponding to the approach bridge portion and the pier portion; when the opening is located at the bridge top portion and the approach bridge portion, the patterned region includes a region corresponding to the pier portion, and the mask is covered on the patterned region; or when the opening is located at the bridge top portion, the approach bridge portion, and the pier portion, the mask is covered on a connection portion between any two portions, or no mask is covered on this region. In some embodiments, the air bridge is cut off in a manner of not covering the mask every predetermined distance, so as to directly obtain a plurality of separated air bridges.

At Step 909. Opening treatment on the basic air bridge is performed based on the mask, to obtain the air bridge having the opening.

In some embodiments, light is applied to the photoresist used for fabricating an opening, the photoresist used for fabricating an opening is exposed, and the exposed photoresist used for fabricating an opening is developed, to obtain an opening pattern of the air bridge. Etching is performed on the basic air bridge based on the opening pattern, and the photoresist used for fabricating an opening on a peripheral side of the air bridge is released. An etching material is released from the opening, and the bridge brace material is etched, to obtain the air bridge having the opening.