The composition according to an embodiment may be prepared by a method including: preparing quantum dot dispersion including the aforementioned luminescent nanostructures of an embodiment, dispersant, and solvent; and mixing the quantum dot dispersion with an initiator; the polymerizable monomers (e.g., acryl-based monomers); optionally, with a thiol compound; optionally, with a metal oxide particulate, and optionally, the aforementioned additives. Each of the aforementioned components may be mixed sequentially or simultaneously, but mixing orders are not particularly limited.
The composition according to an embodiment may be used to provide a pattern of a quantum dot composite (e.g., a quantum dot polymer composite). The composition may provide the quantum dot-polymer composite by (e.g., radical) polymerization. The composition according to an embodiment may be a quantum dot-containing photoresist composition to which a photolithography process may be applied. The composition according to an embodiment may be an ink composition that may provide a pattern by printing (e.g., a droplet discharge method such as inkjet printing).
In an embodiment, the color conversion layer (or the patterned film of the quantum dot-polymer composite) may be prepared using a photoresist composition. The method may include forming a film of the aforementioned composition on a substrate; optionally prebaking the film; exposing a selected region of the film to light (e.g., a wavelength of less than or equal to about 400 nm); and developing the exposed film with an alkali developing solution to obtain a pattern of the quantum dot-polymer composite.